The above discussion also suggests there is a considerably largeTE conversion in the thin STE-coated films, because the actual solution containing the constituent elements17_19. Finally, a Pt filmwas formed by sputtering over the whole area of the Bi:YIG.Typical cross-sectional transmission electron microscopy (TEM)images, shown in Fig. 2b, indicate that the crystalline Bi:YIG filmwas successfully formed on the GGG substrate with a coherentinterface. The thicknesses of the GGG substrate, Bi:YIG filmand Pt film are tGGG D 0:7 mm, tYIG D 60nm and tPt D 10 nm,respectively. The measured sample area is 5 _ 2mm2. It shouldbe emphasized that the above process can be easily applied tolarge-area manufacturing, as it does not require patterning stepssuch as photolithography.
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